The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
Sep. 08, 2005
Applicants:
Makoto Abe, Sendai, JP;
Hiroki Kaneko, Hitachi, JP;
Takuya Takahashi, Hitachi, JP;
Etsuko Nishimura, Hitachiota, JP;
Yoshitaka Tsutsui, Sendai, JP;
Takaaki Suzuki, Nishiibaragi, JP;
Inventors:
Makoto Abe, Sendai, JP;
Hiroki Kaneko, Hitachi, JP;
Takuya Takahashi, Hitachi, JP;
Etsuko Nishimura, Hitachiota, JP;
Yoshitaka Tsutsui, Sendai, JP;
Takaaki Suzuki, Nishiibaragi, JP;
Assignee:
Future Vision Inc., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41M 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A substrate with plane patterns formed in a liquid process wherein the plane patterns are formed based on a combination of plane shapes by which a difference in internal pressure of a solution between any two points of the solution is small, the solution being ejected onto the substrate so as to form the plane patterns by the liquid process.