The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
May. 29, 2007
Applicants:
Hong Wang, Cupertino, CA (US);
Zhimin Liu, San Jose, CA (US);
Inventors:
Hong Wang, Cupertino, CA (US);
Zhimin Liu, San Jose, CA (US);
Assignee:
OptoTrace Technologies, Inc., Mountain View, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G01N 21/03 (2006.01); G01J 3/44 (2006.01);
U.S. Cl.
CPC ...
Abstract
A micro structure includes a silicon substrate, an adhesion layer on the silicon substrate, a bias layer on the adhesion layer, and structure layers on the adhesion layer. The two or more structure layers comprise different material compositions and a plurality of holes through at least two of the structure layers. Widths of the plurality of holes are in the range of 0.5-500 nm.