The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
May. 21, 2008
Tao Pan, Shanghai, CN;
Weijun-william Wang, Shanghai, CN;
Linan Zhao, Shanghai, CN;
Hongda LI, Beijing, CN;
Tao Pan, Shanghai, CN;
Weijun-William Wang, Shanghai, CN;
Linan Zhao, Shanghai, CN;
Hongda Li, Beijing, CN;
Honeywell International Inc., Morristown, NJ (US);
Abstract
Systems and methods are disclosed that promote the remediation of contaminated materials that are produced during industrial processes. These systems and methods include heating a material, transferring heat from the material to an industrial process. During this transfer, contaminants may be introduced into the material. These methods may remove the contaminant by treating the material with a surface modified nanoceramic through nanofiltration and/or active sites adsorption/reaction. The surface modified nanoceramic may remove at least part of the contaminant in the material. No cooling required prior to removing the contaminant from the material, which can lead to great energy saving and pollution reduction.