The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
Oct. 05, 2007
Applicants:
John M. Hawes, Averill Park, NY (US);
David S. Rougvie, Appleton, WI (US);
Inventors:
John M. Hawes, Averill Park, NY (US);
David S. Rougvie, Appleton, WI (US);
Assignee:
Albany International Corp., Albany, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
D21F 7/08 (2006.01); D21F 1/10 (2006.01); D21F 7/10 (2006.01); D21F 7/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
A laminated on-machine-seamable industrial fabric made from a flat woven full width base fabric layer wherein the base fabric layer is folded inwardly and flattened to produce a fabric with seaming loops disposed at the two widthwise edges.
Hawes, John. (2011). Flat woven full width on-machine-seamable fabric (U.S. Patent No. 7892402). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7892402
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile