The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
Jan. 30, 2009
Noboru Nakao, Kobe, JP;
Shinichi Miura, Kobe, JP;
Takeshi Yamashita, Kobe, JP;
Akitoshi Fujisawa, Kobe, JP;
Noboru Nakao, Kobe, JP;
Shinichi Miura, Kobe, JP;
Takeshi Yamashita, Kobe, JP;
Akitoshi Fujisawa, Kobe, JP;
Kobe Steel, Ltd., Hyogo, JP;
Abstract
A PSA apparatus for high-purity hydrogen gas production is provided which can recover high purity hydrogen gas at a high recovery rate from a reformed gas (hydrogen-containing gas) produced by a reforming process, for example an autothermal reforming process, and containing, as impurity components, at least CO, CO2, N2 and/or Ar, and can contribute to reducing the equipment size, hence reducing the equipment cost. The PSA apparatus for high-purity hydrogen gas B production by removing CO, CO2 and N2 by adsorption from a hydrogen containing gas A, comprises an adsorption tower; and an adsorbent bedin the adsorption tower, wherein, on the occasion of regeneration of the adsorbent bed, a purge gas C is passed through in the direction opposite to the direction of passage of the hydrogen-containing gas A.