The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
Aug. 01, 2005
Ryota Sasajima, Toyama, JP;
Iwao Nakamura, Toyama, JP;
Akira Morohashi, Toyama, JP;
Ryuji Yamamoto, Kodaira, JP;
Ryota Sasajima, Toyama, JP;
Iwao Nakamura, Toyama, JP;
Akira Morohashi, Toyama, JP;
Ryuji Yamamoto, Kodaira, JP;
Hitachi Kokusai Electric, Inc., Tokyo, JP;
Abstract
Heat treatment apparatus and a method of manufacturing a substrate are provided, in which drop of particles produced by a rubbing action between a support strip and a support member can be prevented. Heat treatment apparatushas a reactorfor treating a substrate, and a support toolfor supporting the substratein the reactor. The support toolhas a support partto be contacted to the substrate, and a support stripfor supporting the support part. A back of the support parthas a convex portion or a concave portion, and the back of the support partis configured to be not contacted to an edge of the support strip, and contacted to a top of the support stripat inner than the edge of the support strip