The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
Oct. 10, 2008
Applicants:
Alexander Bietsch, Rueschlikon, CH;
Emmanuel Delamarche, Thalwil, CH;
Bruno Michel, Adliswil, CH;
Heinz Schmid, Waedenswil, CH;
Heiko Wolf, Pfaeffikon, CH;
Inventors:
Alexander Bietsch, Rueschlikon, CH;
Emmanuel Delamarche, Thalwil, CH;
Bruno Michel, Adliswil, CH;
Heinz Schmid, Waedenswil, CH;
Heiko Wolf, Pfaeffikon, CH;
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B41M 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for transferring a pattern from an elastic stamp to a substrate in the presence of a third medium is described. A proximity contact is achieved between the stamp and the substrate. A layer of the third medium between the stamp and the substrate is controlled to a predetermined thickness. Stamps for carrying out this method are also described.