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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7890912 B1

PDFFull Text
Date of Patent:
Feb. 15, 2011

Filed:

Nov. 08, 2007

Treatment of trim photomask data for alternating phase shift lithography

Applicant:

Carl A. Vickery, Iii, Garland, TX (US);

Inventor:

Carl A. Vickery, III, Garland, TX (US);

Assignee:

Texas Instruments Incorporated, Dallas, TX (US);

Attorneys:

Warren L. Franz

Wade J. Brady, III

Frederick J. Telecky, Jr.

Primary Examiner:

Vuthe Siek

Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

In accordance with the invention, there is a method of designing a lithography mask. The method can comprise generating initial phase photomask data and initial trim photomask data from a first set of data from a first drawn layer and/or layout and a second set of data from a second drawn layer, combining the initial phase photomask data with the first set of data to form a combined layer, inspecting for gaps in the combined layer, and processing the gaps in the combined layer.

Find Patent Forward Citations

Vickery, III, Carl. (2011). Treatment of trim photomask data for alternating phase shift lithography (U.S. Patent No. 7890912). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7890912

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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