The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Sep. 09, 2005
Tohru Kimura, Hachioji, JP;
Yuichi Atarashi, Hachioji, JP;
Kiyono Ikenaka, Hino, JP;
Kenji Ogiwara, Hachioji, JP;
Eiji Nomura, Hachioji, JP;
Tohru Kimura, Hachioji, JP;
Yuichi Atarashi, Hachioji, JP;
Kiyono Ikenaka, Hino, JP;
Kenji Ogiwara, Hachioji, JP;
Eiji Nomura, Hachioji, JP;
Konica Minolta Opto, Inc., Tokyo, JP;
Abstract
A first phase structure corrects at least one of a spherical aberration due to a difference between a protective substrate thickness t1 and a protective substrate thickness t2 and a spherical aberration due to a difference between a first wavelength λ1 and a second wavelength λ2, and a second phase structure corrects at least one of a spherical aberration generated when the first wavelength λ1 is changed in a range of ±10 nm, a best image point movement generated when the first wavelength λ1 is changed in a range of ±10 nm, and a spherical aberration generated when environmental temperature is changed.