The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Aug. 08, 2009
Kuan-neng Chen, White Plains, NY (US);
Lia Krusin-elbaum, Dobbs Ferry, NY (US);
Chung H. Lam, Peekskill, NY (US);
Albert M. Young, Fishkill, NY (US);
Kuan-Neng Chen, White Plains, NY (US);
Lia Krusin-Elbaum, Dobbs Ferry, NY (US);
Chung H. Lam, Peekskill, NY (US);
Albert M. Young, Fishkill, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of fabricating a programmable via structure is provided. The method includes providing a patterned heating material on a surface of an oxide layer. The oxide layer is located above a semiconductor substrate. A patterned dielectric material is formed having a least one via on a surface of the patterned heating material. The at least one via is filled with a phase change material such that a lower surface of the phase change material is in direct contact with a portion of the patterned heating material. A patterned diffusion barrier is formed on an exposed surface of the at least one via filled with the phase change material. A method of programmable a programmable via structure made by the method is also disclosed.