The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Mar. 14, 2007
Kazuyoshi Mizutani, Haibara-gun, JP;
Kaoru Iwato, Haibara-gun, JP;
Kunihiko Kodama, Haibara-gun, JP;
Masaomi Makino, Haibara-gun, JP;
Kazuyoshi Mizutani, Haibara-gun, JP;
Kaoru Iwato, Haibara-gun, JP;
Kunihiko Kodama, Haibara-gun, JP;
Masaomi Makino, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.