The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Mar. 22, 2002
Adrian Boyle, Monasterevin, IE;
Oonagh Meighan, Dublin, IE;
Gillian Walsh, Dublin, IE;
Kia Woon Mah, Dublin, IE;
Adrian Boyle, Monasterevin, IE;
Oonagh Meighan, Dublin, IE;
Gillian Walsh, Dublin, IE;
Kia Woon Mah, Dublin, IE;
Electro Scientific Industries, Inc., Portland, OR (US);
Abstract
A substrate () is machined to form, for example, a via. The substrate is in a chamber () within which the gaseous environment is controlled. The machining laser beam () is delivered with control of parameters such as pulsing parameters to achieve desired effects. The gaseous environment may be controlled to control integral development of an insulating lining for a via, thereby avoiding the need for downstream etching and oxide growth steps. Also, machining may be performed in multiple passes in order to minimize thermal damage and to achieve other desired effects such as a particular via geometry.