The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Sep. 09, 2004
Applicants:
Benjamin Chu, Setauket, NY (US);
Benjamin S. Hsaio, Setauket, NY (US);
Dufei Fang, East Setauket, NY (US);
Inventors:
Benjamin Chu, Setauket, NY (US);
Benjamin S. Hsaio, Setauket, NY (US);
Dufei Fang, East Setauket, NY (US);
Assignee:
The Research Foundation of State University of New York, Albany, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
D01D 5/14 (2006.01); D01D 4/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
A spinneret format, an electric-field reversal format and a process for post-treatment of membranes formed from electro-spinning or electro-blowing are provided, including a cleaning method and apparatus for electro-blowing or blowing-assisted electro-spinning technology.