The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Sep. 20, 2005
Toshimasa Takeuchi, Hachioji, JP;
Setsuo Nakajima, Hachioji, JP;
Naomichi Saito, Hachioji, JP;
Osamu Nishikawa, Hachioji, JP;
Toshimasa Takeuchi, Hachioji, JP;
Setsuo Nakajima, Hachioji, JP;
Naomichi Saito, Hachioji, JP;
Osamu Nishikawa, Hachioji, JP;
Sekisui Chemical Co., Ltd., Osaka, JP;
Abstract
To prevent occurrence of arcing caused by difference of thermal expansion between the electrode and the solid dielectric in a plasma processing apparatus. The bottom part of a casingof processing unitsL,R is open, this opening part is closed with a solid dielectric plate, and an electrodeis received in the casingsuch that the electrodeis free in the longitudinal direction. The solid dielectric platehas such strength as capable of supporting the dead weight of the electrodesolely by itself. The electrodeis placed on the upper surface of the solid dielectric plateis a non-fixed state such that the dead weight of the electrodeis almost totally applied to the solid dielectric plate