The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Dec. 20, 2005
Applicants:
Young Jong Lee, Sungnam-shi, KR;
Jun Young Choi, Seoul, KR;
Saeng Hyun JO, Daejeon, KR;
Young-joo Hwang, Seoul, KR;
Jong-cheon Kim, Pyeongtaek, KR;
Inventors:
Young Jong Lee, Sungnam-shi, KR;
Jun Young Choi, Seoul, KR;
Saeng Hyun Jo, Daejeon, KR;
Young-Joo Hwang, Seoul, KR;
Jong-Cheon Kim, Pyeongtaek, KR;
Assignee:
Advanced Display Process Engineering Co. Ltd., Sungnam-shi, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/50 (2006.01); C23C 16/503 (2006.01); C23C 16/505 (2006.01); C23C 16/509 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); C23C 16/06 (2006.01); C23C 16/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
A plasma processing apparatus for generating plasma in a chamber maintained in a vacuum state and processing a substrate using the plasma. The plasma processing apparatus includes a refrigerant channel for circulating a refrigerant formed in a shower head, thereby easily controlling the temperature of the shower head and improving the reproducibility of plasma treatment.