The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2011
Filed:
Sep. 28, 2007
Applicants:
Hideaki Hirabayashi, Yokohama, JP;
Naoaki Sakurai, Yokohama, JP;
Akiko Saito, Yokohama, JP;
Koji Sato, Chita-gun, JP;
Tomiho Yamada, Ohbu, JP;
Inventors:
Hideaki Hirabayashi, Yokohama, JP;
Naoaki Sakurai, Yokohama, JP;
Akiko Saito, Yokohama, JP;
Koji Sato, Chita-gun, JP;
Tomiho Yamada, Ohbu, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract
A polishing cloth used in the chemical mechanical polishing treatment comprises a molded body of (meth)acrylic copolymer having an acid value of 10 to 100 mg KOH/g and a hydroxyl group value of 50 to 150 mg KOH/g.