The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2011
Filed:
Aug. 19, 2008
Robert Glenn Biskeborn, Hollister, CA (US);
Cherngye Hwang, San Jose, CA (US);
Calvin Shyhjong Lo, Saratoga, CA (US);
Andrew C. Ting, El Prado, NM (US);
Robert Glenn Biskeborn, Hollister, CA (US);
Cherngye Hwang, San Jose, CA (US);
Calvin Shyhjong Lo, Saratoga, CA (US);
Andrew C. Ting, El Prado, NM (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method according to one embodiment includes ion milling at a first angle of greater than about 25 degrees from normal relative to a media facing side of a thin film region of a magnetic head or component thereof for recessing the thin film region at about a constant rate for films of interest of the thin film region, planes of deposition of the films being oriented about perpendicular to the media facing side; and ion milling or plasma sputtering at a second angle of less than about 25 degrees from normal relative to the media facing side of the thin film region for recessing magnetic films therein faster than insulating films therein, the second angle being smaller than the first angle.