The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2011
Filed:
Oct. 17, 2005
William Dick, Minneapolis, MN (US);
Benjamin Y. H. Liu, North Oaks, MN (US);
William Dick, Minneapolis, MN (US);
Benjamin Y. H. Liu, North Oaks, MN (US);
MSP Corporation, Shoreview, MN (US);
Abstract
A method for establishing a calibrating standard for wafer inspection includes depositing solid ionized particles of a known size range with an aerosol onto a wafer. The method also includes depositing particles onto a wafer in a deposition chamber by using an aerosol stream and the solid particles suspended in a gas; ionizing the aerosol stream with a negative or positive charge polarity or both by passing the aerosol stream through a non-radioactive ionizer to produce charged particles and supplying such aerosol stream to the deposition chamber. An apparatus for producing charged particles includes an atomizer and a non-radioactive ionizer in fluid communication with each other. The apparatus may also include an electrospray droplet generator for producing an aerosol with dry-solid particles and an ionizer that ionizes the molecules of the gas. The apparatus may also include a generator for generating an aerosol with particles suspended in the gas with a non-radioactive ionizer that ionizes the gas in the aerosol causing the aerosol particles to be charged. The apparatus may further include an electrostatic classifier for classifying the charged particles to a selected size range.