The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2011
Filed:
Feb. 22, 2008
Fook-luen Heng, Yorktown Heights, NY (US);
Jason D. Hibbeler, Williston, VT (US);
Kevin W. Mccullen, Essex Junction, VT (US);
Rani R. Narayan, San Jose, CA (US);
Stephen L. Runyon, Pflugerville, TX (US);
Robert F. Walker, St. George, VT (US);
Fook-Luen Heng, Yorktown Heights, NY (US);
Jason D. Hibbeler, Williston, VT (US);
Kevin W. McCullen, Essex Junction, VT (US);
Rani R. Narayan, San Jose, CA (US);
Stephen L. Runyon, Pflugerville, TX (US);
Robert F. Walker, St. George, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The invention includes a solution for selectively scaling an integrated circuit (IC) design by: layer, region or cell, or a combination of these. The selective scaling technique can be applied in a feedback loop with the manufacturing system with process and yield feedback, during the life of a design, to increase yield in early processes in such a way that hierarchy is preserved. The invention removes the need to involve designers in improving yield.