The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7880862 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 01, 2011

Filed:

Dec. 19, 2007
Applicants:

Nobuyuki Saito, Utsunomiya, JP;

Haruna Kawashima, Haga-gun, JP;

Inventors:

Nobuyuki Saito, Utsunomiya, JP;

Haruna Kawashima, Haga-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/74 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exposure apparatus comprising a projection optical system configured to project a pattern image of an original onto a substrate, and a sensor configured to detect light emerging from the projection optical system, the sensor including a light receiving element having a light receiving surface, and an optical member having a reflection surface which reflects the light emerging from the projection optical system toward the light receiving surface, wherein the reflection surface forms an acute angle with respect to the light receiving surface.


Find Patent Forward Citations

Saito, Nobuyuki. (2011). Exposure apparatus and device fabrication method (U.S. Patent No. 7880862). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7880862

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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