The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 01, 2011

Filed:

Oct. 23, 2006
Applicants:

Bartley K. Andre, Menlo Park, CA (US);

Daniel J. Coster, San Francisco, CA (US);

Richard P. Howarth, San Francisco, CA (US);

Daniele DE Iuliis, San Francisco, CA (US);

Jonathan P. Ive, San Francisco, CA (US);

Duncan Robert Kerr, San Francisco, CA (US);

Shin Nishibori, San Francisco, CA (US);

Matthew Dean Rohrbach, San Francisco, CA (US);

Douglas B. Satzger, Menlo Park, CA (US);

Calvin Q. Seid, Palo Alto, CA (US);

Christopher J. Stringer, Portola Valley, CA (US);

Eugene Antony Whang, San Francisco, CA (US);

Rico Zörkendörfer, San Francisco, CA (US);

David Morgenstern, Palo Alto, CA (US);

Paul C. L. Chow, San Jose, CA (US);

Inventors:

Bartley K. Andre, Menlo Park, CA (US);

Daniel J. Coster, San Francisco, CA (US);

Richard P. Howarth, San Francisco, CA (US);

Daniele de Iuliis, San Francisco, CA (US);

Jonathan P. Ive, San Francisco, CA (US);

Duncan Robert Kerr, San Francisco, CA (US);

Shin Nishibori, San Francisco, CA (US);

Matthew Dean Rohrbach, San Francisco, CA (US);

Douglas B. Satzger, Menlo Park, CA (US);

Calvin Q. Seid, Palo Alto, CA (US);

Christopher J. Stringer, Portola Valley, CA (US);

Eugene Antony Whang, San Francisco, CA (US);

Rico Zörkendörfer, San Francisco, CA (US);

David Morgenstern, Palo Alto, CA (US);

Paul C. L. Chow, San Jose, CA (US);

Assignee:

Apple Inc., Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G09G 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An invisible, light-transmissive display system with a light resistant material is provided. Substantially invisible, tapered, light-transmissive holes are penetrated in a light-transmissive pattern through at least a portion of the light resistant material using a laser beam having a focal width less than the smallest diameter of the tapered holes.


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