The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 01, 2011

Filed:

Dec. 05, 2003
Applicants:

Keun-kyu Song, Yongin-si, KR;

Nam-seok Roh, Seongnam-si, KR;

Mun-pyo Hong, Seongnam-si, KR;

Inventors:

Keun-Kyu Song, Yongin-si, KR;

Nam-Seok Roh, Seongnam-si, KR;

Mun-Pyo Hong, Seongnam-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a stripping composition for easily removing a photoresist without an adverse effect and a method of manufacturing a TFT substrate for an LCD device using the same, the stripping composition includes acetic acid and ozone gas contained in the acetic acid as a bubble form to remove the photoresist including novolak. A photoresist pattern including novolak is formed on a predetermined layer () formed on a substrate (). The layer is etched using the photoresist pattern as a mask to form a pattern of the layer. The photoresist pattern is removed using the stripping composition. The stripping composition is cheap and more effectively protects the environment in comparison with the conventional stripping compositions. Additionally, an Oashing process performed before or after a stripping process may be omitted to thereby simplify a stripping process.


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