The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2011
Filed:
Dec. 19, 2006
Dong-youn Shin, Daegu-si, KR;
Dong-soo Kim, Daejeon-si, KR;
So-nam Yun, Daejeon-si, KR;
Young-bog Ham, Daejeon-si, KR;
Byung-oh Choi, Daejeon-si, KR;
Dong-Youn Shin, Daegu-si, KR;
Dong-Soo Kim, Daejeon-si, KR;
So-Nam Yun, Daejeon-si, KR;
Young-Bog Ham, Daejeon-si, KR;
Byung-Oh Choi, Daejeon-si, KR;
Abstract
Disclosed herein is a method for forming a pattern, comprising: attaching a single-layer or multi-layer dry film resist made of a semi-solid or solid material to part or all of the surface of a substrate; exposing the dry film resist to light either by irradiating a focusable energy beam directly onto the resist or by projecting a specific wavelength range of light onto the resist, to form a region to be filled with a functional material; charging the functional material into the formed region using a method such as inkjetting; drying the functional material; and removing the dry film resist, thus obtaining the desired pattern.