The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2011
Filed:
Mar. 01, 2007
Leonid C. Lev, West Bloomfield, MI (US);
Jon T. Carter, Farmington, MI (US);
Yang T. Cheng, Troy, MI (US);
Carolina C. Ang, Bloomfield, MI (US);
Leonid C. Lev, West Bloomfield, MI (US);
Jon T. Carter, Farmington, MI (US);
Yang T. Cheng, Troy, MI (US);
Carolina C. Ang, Bloomfield, MI (US);
GM Global Technology Operations LLC, Detroit, MI (US);
Abstract
A method for forming an aperture includes stamping an aperture into the article using a pellet, and refining aperture shape(s) and/or aperture dimensions. Methods for forming articles having reduced residual compressive stress are also disclosed. Very generally, the methods include establishing a diamond coating on at least a portion of a substrate, and applying a stress-relief process to the diamond coating, the substrate, or combinations thereof.