The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2011
Filed:
May. 30, 2007
Alberto Salleo, San Francisco, CA (US);
Steven E. Ready, Los Altos, CA (US);
Alberto Salleo, San Francisco, CA (US);
Steven E. Ready, Los Altos, CA (US);
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Abstract
Black matrix (BM) material is deposited on glass and patterned to form walls that define an array of wells. Various surface treatments and masking schemes are utilized to achieve surface energy control of the BM glass. The surface treatments include one or more of chemically treating the BM walls by depositing hydrophobic self-assembled monolayers on the uppermost wall surfaces, and plasma treatments to control the surface energy of the various BM glass surfaces. Masking processes include backside exposure and development of photoresist, and maskless, self-aligned photo-patterning of the monolayers. Color filter ink is then injected into each well from an ink jet print head. The high surface energy of the lower and side wall surfaces facilitates wetting of the ink, and the low surface energy of the monolayers prevents intermixing of ink between adjacent wells. The ink then dries to form a color filter in each well.