The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2011
Filed:
Jul. 21, 2006
Edward Raymond Dowski, Jr., Lafayette, CO (US);
Gregory E. Johnson, Boulder, CO (US);
Kenneth S. Kubala, Boulder, CO (US);
Wade Thomas Cathey, Jr., Boulder, CO (US);
Edward Raymond Dowski, Jr., Lafayette, CO (US);
Gregory E. Johnson, Boulder, CO (US);
Kenneth S. Kubala, Boulder, CO (US);
Wade Thomas Cathey, Jr., Boulder, CO (US);
OmniVision Technologies, Inc., Santa Clara, CA (US);
Abstract
An optical lithography system that has extended depth of focus exposes a photoresist coating on a wafer, and includes an illumination sub-system, a reticle, and an imaging lens that has a pupil plane function to form an aerial image of the reticle proximate to the photoresist. The pupil plane function provides the extended depth of focus such that the system may be manufactured or used with relaxed tolerance, reduced cost and/or increased throughput. The system may be used to form precise vias within integrated circuits even in the presence of misfocus or misalignment.