The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2011
Filed:
Mar. 25, 2005
Yuzuru Takamura, Ishikawa, JP;
Akiko Iiduka, Hitachinaka, JP;
Eiichi Tamiya, Kanazawa, JP;
Japan Advanced Institute of Science and Technology, Ishikawa, JP;
Abstract
A method for generating plasma and a method for elemental analysis, each comprising the steps of providing a narrow portion in a flow channel made of an insulation material, the narrow portion having a cross-sectional area markedly smaller than a cross-sectional area of the flow channel; filling the flow channel and the narrow portion with a conductive liquid, and thereafter applying an electric field to the narrow portion, to conduct the electric field through the narrow portion, thereby generating plasma at the narrow portion. An apparatus for generating plasma, the apparatus for generating plasma comprising a narrow portion in a flow channel made of an insulation material, the narrow portion having a cross-sectional area markedly smaller than a cross-sectional area of the flow channel; and a means of applying an electric field to the narrow portion to conduct the electric field through the narrow portion; and an apparatus for emission spectroscopic analysis comprising the apparatus for generating plasma as defined above.