The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2011
Filed:
Aug. 30, 2007
Han Feng Chang, Taipei, TW;
Pang Chi Liu, Taipei, TW;
Chin Yen Yeh, Taipei, TW;
Shih Hsien MA, Taipei, TW;
Minte Lin, Taipei, TW;
Kuan Lan Fang, Taipei, TW;
Wei Tai Tang, Taipei, TW;
Don Yau Chiang, Taipei, TW;
Han Feng Chang, Taipei, TW;
Pang Chi Liu, Taipei, TW;
Chin Yen Yeh, Taipei, TW;
Shih Hsien Ma, Taipei, TW;
Minte Lin, Taipei, TW;
Kuan Lan Fang, Taipei, TW;
Wei Tai Tang, Taipei, TW;
Don Yau Chiang, Taipei, TW;
CMC Magnetics Corporation, , TW;
Abstract
An optical recording medium is provided with inorganic bi-layer films that were prepared by magnetic sputtering. A first recording layer containing an element selected from Si or Ge, and a second recording layer contacts with the first recording layer and containing a primary component selected from Ta, Ni or Mo. This optical media can record information by way of microscopic structure changing of bi-layer recording films after laser irradiation.