The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2011
Filed:
Oct. 18, 2007
Ute Natura, Jena, DE;
Martin Letz, Mainz, DE;
Lutz Parthier, Kleinmachnow, DE;
Hellma Materials GmbH & Co. KG, Jena, DE;
Abstract
A process and a device is described to avoid the depolarization of linear-polarized light during the transmission of light through crystals exhibiting a {111} or {100} crystal plane, respectively, and a <100> or <111> crystal axis, respectively. The device is characterized in that the linear-polarized light meets the surface of the crystals in an angle of 45-75°, whereby the surface is formed by the {111} or the {100} plane. The crystal is arranged in such a way that upon entering the crystal, the light spreads along the <100> or <111> crystal axis, respectively, as parallel as possible, and/or that the device comprises a unit for temperature equalization to avoid a thermal gradient in the crystal. Preferably the device is used in DUV lithography, in particular in steppers and excimer lasers, as well as for the production of integrated circuits, computer chips as well as electronic devices such as computers, and other devices that comprise chip-type integrated circuits, as well as for flat screens.