The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2011
Filed:
Mar. 19, 2010
Tadashi Yamaguchi, Tokyo, JP;
Keiichiro Kashihara, Tokyo, JP;
Tomonori Okudaira, Tokyo, JP;
Toshiaki Tsutsumi, Tokyo, JP;
Tadashi Yamaguchi, Tokyo, JP;
Keiichiro Kashihara, Tokyo, JP;
Tomonori Okudaira, Tokyo, JP;
Toshiaki Tsutsumi, Tokyo, JP;
Renesas Electronics Corporation, Kawasaki-shi, JP;
Abstract
An N-type source region and an N-type drain region of N-channel type MISFETs are implanted with ions (containing at least one of F, Si, C, Ge, Ne, Ar and Kr) with P-channel type MISFETs being covered by a mask layer. Then, each gate electrode, source region and drain region of the N- and P-channel type MISFETs are subjected to silicidation (containing at least one of Ni, Ti, Co, Pd, Pt and Er). This can suppress a drain-to-body off-leakage current (substrate leakage current) in the N-channel type MISFETs without degrading the drain-to-body off-leakage current in the P-channel type MISFETs.