The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2011
Filed:
Jul. 31, 2008
Noriyuki Yamada, Tokyo, JP;
Takeshi Nishijima, Tokyo, JP;
Noriyuki Yamada, Tokyo, JP;
Takeshi Nishijima, Tokyo, JP;
Agilent Technologies, Inc., Santa Clara, CA (US);
Abstract
A side wallthat extends in the axial direction enclosing the plasma in such a way that expansion of plasma to the sides is prevented at the back surface of a skimmer coneand a small collision chamber, which is positioned at the back side of this side walland is defined by a flat partof a first electrodehaving an openingthrough which the ion beam can pass. By means of this small collision chamber, the pressure inside the chamber rises without introducing additional gas; therefore, argon ions are neutralized by collision and recombination between the ions and electrons and the ion density of the plasma is reduced. Thus, the beam diameter during ion extraction and transport is maintained relatively small.