The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2011
Filed:
Apr. 10, 2006
Jitsuo Oishi, Kanagawa, JP;
Takashi Makinoshima, Kanagawa, JP;
Ko Kedo, Tokyo, JP;
Shuta Kihara, Kanagawa, JP;
Jitsuo Oishi, Kanagawa, JP;
Takashi Makinoshima, Kanagawa, JP;
Ko Kedo, Tokyo, JP;
Shuta Kihara, Kanagawa, JP;
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Abstract
The invention is directed to a process for producing polyimide film, including stretching, at 150° C. to 380° C. and a stretch ratio of 1.2 to 4.0, an unstretched polyimide film which is formed from a polyimide having a repeating unit represented by formula (1): (wherein R represents a tetravalent group derived from cyclohexane; and Φ represents a divalent aliphatic, alicyclic, or aromatic group, or a combination thereof that has a total number of carbon atoms of 2 to 39 and may have at least one connecting group selected from the group consisting of —O—, —SO—, —CO—, —CH—, —C(CH)—, —OSi(CH)—, —CHO—, and —S—) and which has an organic solvent content of 0.5 wt. % or more and less than 30 wt. %. The produced polyimide film exhibits transparency, excellent heat resistance, and reduced dimensional changes.