The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2011
Filed:
Aug. 31, 2006
Masamichi Hikosaka, Higashihiroshima, JP;
Kaori Watanabe, Higashihiroshima, JP;
Masamichi Hikosaka, Higashihiroshima, JP;
Kaori Watanabe, Higashihiroshima, JP;
National University of Corporation Hiroshima University, Higashihiroshima-shi, JP;
Abstract
A method and means for determining a critical elongation strain rate of a polymer melt, which make it possible to subject a polymer melt to elongation to prepare a bulk oriented melt, are established, and a process for producing bulk polymer oriented crystals and polymer oriented crystals are provided. In the critical elongation strain rate determination process or critical elongation strain rate determining method, a polymer melt () in a disc shape having a radius xand a thickness of Δzis held between transparent plates (an upper transparent plate () and a lower transparent plate ()). The polymer melt () is cooled to a supercooled state and is press in a thickness direction at a constant rate v by using the transparent plates. The critical point radius x*, at which the polymer melt () is turned to an oriented crystal, is measured, and the critical elongation strain rate ε is calculated by equation ε*=ax*wherein α=v/(2Δzx).