The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2011
Filed:
Dec. 29, 2008
Applicants:
Guo Bin LI, Shenzhen, CN;
Wei Jun Zhang, Shenzhen, CN;
Inventors:
Guo Bin Li, Shenzhen, CN;
Wei Jun Zhang, Shenzhen, CN;
Assignee:
Siemens Aktiengesellschaft, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01V 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a method and device for suppressing residual motion artifacts, k-space is divided into a snapshot segment, an alternate sampling segment and a high frequency segment in a phase encoding direction; then phase encoding lines are respectively sampled within each of the segments; and a magnetic resonance image is reconstructed according to the phase encoding lines within k-space.
Li, Guo. (2011). Method and device for suppressing motion artifacts in magnetic resonance imaging (U.S. Patent No. 7868615). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7868615
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile