The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2011

Filed:

Jul. 31, 2006
Applicants:

Takeshi Watanabe, Yokohama, JP;

Kimitoshi Okano, Yokohama, JP;

Takashi Izumida, Yokohama, JP;

Inventors:

Takeshi Watanabe, Yokohama, JP;

Kimitoshi Okano, Yokohama, JP;

Takashi Izumida, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/088 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor device includes a fin-shaped semiconductor layer, a gate electrode section formed in a widthwise direction of the semiconductor layer with a gate insulation film interposed therebetween, the gate electrode section including a plurality of electrode materials having different work functions and stacked one another, and a channel section formed adjacent to the gate insulation film in the semiconductor layer. The semiconductor device further includes source and drain regions formed adjacent to the channel section.


Find Patent Forward Citations

Watanabe, Takeshi. (2011). Metal insulator semiconductor field effect transistor having fin structure (U.S. Patent No. 7868395). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7868395

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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