The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2011

Filed:

Dec. 11, 2007
Applicants:

William A. Wachter, Flemington, NJ (US);

Jeffrey T. Elks, Geneva, IL (US);

Brenda A. Raich, Annandale, NJ (US);

Theodore E. Datz, Easton, PA (US);

Mary T. Van Nostrand, Clinton, NJ (US);

Gordon F. Stuntz, Hellertown, PA (US);

David O. Marler, Easton, PA (US);

Nicholas Rollman, Slatington, PA (US);

Inventors:

William A. Wachter, Flemington, NJ (US);

Jeffrey T. Elks, Geneva, IL (US);

Brenda A. Raich, Annandale, NJ (US);

Theodore E. Datz, Easton, PA (US);

Mary T. Van Nostrand, Clinton, NJ (US);

Gordon F. Stuntz, Hellertown, PA (US);

David O. Marler, Easton, PA (US);

Nicholas Rollman, Slatington, PA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J 35/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

Catalysts for experimentation are produced having a controlled matrix pore structure. The manufacturing process utilizes tape casting in the drying procedure in which a catalyst slurry is cast on a substrate and dried at a temperature of between about 50° C. to 200° C. for a period of time of about 0.1 to 1.0 hour. The dried catalyst particles can be removed from the substrate by several techniques, including scraping, burning, and deforming the substrate material. The resulting catalytic particles can be produced in an amount of about ca. 3 g to 300 g from slurries with volumes between 5 cc to 500 cc, which are suitable for small scale FCC reactors and for high throughput experimentation.


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