The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2011
Filed:
Jan. 05, 2009
Hyeon Jin Shin, Gyeonggi-Do, KR;
Hyun Dam Jeong, Gyeonggi-Do, KR;
Jong Back Seon, Gyeonggi-Do, KR;
Kwang Hee Lee, Gyeonggi-Do, KR;
Sang Kook Mah, Seoul, KR;
Hyeon Jin Shin, Gyeonggi-Do, KR;
Hyun Dam Jeong, Gyeonggi-Do, KR;
Jong Back Seon, Gyeonggi-Do, KR;
Kwang Hee Lee, Gyeonggi-Do, KR;
Sang Kook Mah, Seoul, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
A multi-functional cyclic silicate compound, a siloxane-based polymer prepared from the silicate compound and a process of producing an insulating film using the siloxane-based polymer. The silicate compound of the present invention is highly compatible with conventional pore-generating substances and hardly hygroscopic, so it is useful for the preparation of a siloxane-based polymer suitable to a SOG process. Furthermore, a film produced by the use of such siloxane-based polymer is excellent in mechanical properties, thermal stability and crack resistance and enhanced in insulating properties by virtue of its low hygroscopicity. Therefore, in the field of semiconductor production, this film is of great use as an insulating film.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile