The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2011
Filed:
Sep. 28, 2005
Youichi Hasegawa, Fujinomiya, JP;
Tomonari Ogawa, Fujinomiya, JP;
Kazuhiko Nojo, Fujinomiya, JP;
Fujifilm Corporation, Tokyo, JP;
Abstract
In an aspect of the coating method according to the present invention, the lower limit decompression degree Pat which a seam trouble occurs is obtained from the formula of the viscocapillary model. According to the aspect of the present invention, coating is performed by setting the Pso as to satisfy P<P−P≦P+0.2, and therefore, stepped unevenness can be effectively suppressed so that a seam trouble does not occur. It goes without saying that the aspect of the present invention can be applied to high viscosity/thick film coating, but it is effective especially in the case where a coating solution with low viscosity (for example, 0.005 Pa·s or lower) is coated to be an ultra-thin film (for example, 10 μm or less in the wet film thickness) where stepped unevenness easily occurs.