The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2011
Filed:
Aug. 25, 2006
Hidehisa Murase, Kanagawa, JP;
Yoshinari Sasaki, Tokyo, JP;
Kosei Aso, Kanagawa, JP;
Naoki Yamada, Kanagawa, JP;
Hidehisa Murase, Kanagawa, JP;
Yoshinari Sasaki, Tokyo, JP;
Kosei Aso, Kanagawa, JP;
Naoki Yamada, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Exitech Limited, Oxford, GB;
Abstract
A laser processing apparatus is provided. The laser processing apparatus is for performing pattern processing of a transparent conductive film that is formed on a multilayer film on a substrate by using laser light, includes debris extraction module having a vortex generation mechanism that generates a vortex flow by directing gas into the vicinity of a laser-irradiated portion of the transparent conductive film. The debris extraction module is disposed close to the substrate, and debris before deposition and after deposition on the substrate, which is generated by laser irradiation, is entrapped into the vortex flow to be extracted to the outside with the gas.