The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 04, 2011

Filed:

Mar. 21, 2007
Applicants:

Masaaki Masuda, Nagoya, JP;

Michio Takahashi, Nagoya, JP;

Takeshi Sakuma, Nagoya, JP;

Inventors:

Masaaki Masuda, Nagoya, JP;

Michio Takahashi, Nagoya, JP;

Takeshi Sakuma, Nagoya, JP;

Assignee:

NGK Insulators, Ltd., Nagoya, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 10/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a plasma reactor which can suppress deactivation of components (active components) activated by plasma when causing exhaust gas to flow through a plasma generating space to ensure efficient reaction between the active components and particulate matter, whereby the particulate matter can be efficiently purified via reaction. The plasma reactor includes a plasma reactor main body, a positive electrodedisposed on an inlet sideof the plasma reactor main body, a conductive honeycomb filterdisposed so that a filter inlet sidefaces an outlet sideof the plasma reactor main body, and a pulse power supplywhich is connected with the positive electrodeand the honeycomb filterand is capable of applying a pulse voltage between the positive electrodeand the honeycomb filteras plasma generating electrodes to generate plasma.


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