The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2011
Filed:
Oct. 23, 2006
Xiaoping Bian, Saratoga, CA (US);
Qing Dai, San Jose, CA (US);
Hoa DO, Fremont, CA (US);
Yoshihiro Ikeda, San Jose, CA (US);
David Margulies, Salinas, CA (US);
Mary Frances Minardi, Santa Cruz, CA (US);
Natacha Frederique Supper, Campbell, CA (US);
Kentaro Takano, San Jose, CA (US);
Min Xiao, Los Gatos, CA (US);
Qi-fan Xiao, San Jose, CA (US);
Xiaoping Bian, Saratoga, CA (US);
Qing Dai, San Jose, CA (US);
Hoa Do, Fremont, CA (US);
Yoshihiro Ikeda, San Jose, CA (US);
David Margulies, Salinas, CA (US);
Mary Frances Minardi, Santa Cruz, CA (US);
Natacha Frederique Supper, Campbell, CA (US);
Kentaro Takano, San Jose, CA (US);
Min Xiao, Los Gatos, CA (US);
Qi-Fan Xiao, San Jose, CA (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
An improved structure for the construction of perpendicular recording media is disclosed. The structure includes a perpendicular recording layer with at least two oxide sublayers or a lower sublayer of a non-oxide. One structure includes an upper sublayer comprised of a Silicon-oxide, while a lower sublayer is comprised of a Tantalum-oxide. The structures provide for increased coercivity and corrosion resistance.