The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 04, 2011

Filed:

Jan. 12, 2007
Applicants:

Ferencz S. Denes, Madison, WI (US);

Sorin O. Manolache, Madison, WI (US);

Hongquan Jiang, Madison, WI (US);

Inventors:

Ferencz S. Denes, Madison, WI (US);

Sorin O. Manolache, Madison, WI (US);

Hongquan Jiang, Madison, WI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01); B01J 19/12 (2006.01); H05F 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus and method are disclosed for producing nanoparticles in a dense fluid medium. The method is based on the formation of nanoparticles from nanoparticle precursors in a dense fluid medium in which a plasma discharge is created between electrodes submerged in the dense fluid medium. The electrodes define a plasma discharge zone between opposing electrode discharge faces and further define an internal cavitation zone into which a cavitation gas is released, creating bubbles in the dense fluid medium. The result is the efficient production of nanoparticles using a high-frequency, high-voltage electric field to react dense-phase precursors in an atmospheric pressure, low temperature environment.


Find Patent Forward Citations

Loading…