The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2011
Filed:
Dec. 28, 2006
Mikhail I. Guskov, St. Petersburg, RU;
Mohd A. Aslami, Sturbridge, MA (US);
Dau Wu, Fallbrook, CA (US);
Mikhail I. Guskov, St. Petersburg, RU;
Mohd A. Aslami, Sturbridge, MA (US);
Dau Wu, Fallbrook, CA (US);
Silica Tech, LLC, White Plains, NY (US);
Abstract
The improved plasma torch for making synthetic silica includes use of nitrogen screen gas from outer quartz tubing to provide active environment isolation. In addition, the present induction plasma torch includes a ring disk for more compact but complete environmental protection (360 degree coverage). It also includes offsetting and switching the position of the chemical injection nozzles for allowing improved deposition in both directions, when operated in a horizontal mode. Further, the present induction plasma torch maintains laminar flow for the injected chemicals and the middle quartz tube is provided with a concave section for increasing the average enthalpy of plasma jet, thus improving the efficiency of the plasma torch. In addition, it may utilize more plasma gas inlets. It also includes chemical injection nozzles having a downward angular inclination.