The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2010
Filed:
Jan. 12, 2009
Takashi Kikukawa, Tokyo, JP;
Tatsuya Kato, Tokyo, JP;
Hajime Utsunomiya, Tokyo, JP;
Hiroshi Shingai, Tokyo, JP;
Takashi Kikukawa, Tokyo, JP;
Tatsuya Kato, Tokyo, JP;
Hajime Utsunomiya, Tokyo, JP;
Hiroshi Shingai, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
An information readout method for an optical information medium comprising an information recording layer having pits or recorded marks representative of information data involves the step of irradiating a laser beam to the information recording layer through an objective lens for providing readings of the pits or recorded marks. When the laser beam has a wavelength λ of 400 to 410 nm, the objective lens has a numerical aperture NA of 0.70 to 0.85, and the pits or recorded marks have a minimum size Pof up to 0.36λ/NA, readout is carried out at a power Pr of at least 0.4 mW for the laser beam. When the laser beam has a wavelength λ of 630 to 670 nm, the objective lens has a numerical aperture NA of 0.60 to 0.65, and the pits or recorded marks have a minimum size Pof up to 0.36λ/NA, readout is carried out at a power Pr of at least 1.0 mW for the laser beam. Pits or recorded marks of a size approximate to the resolution limit determined by diffraction can be read out at a high C/N.