The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2010
Filed:
Jun. 29, 2007
Applicants:
Ulrike Roessner, Dresden, DE;
Daniel Koehler, Chemnitz, DE;
Ilona Juergensen, Dresden, DE;
Mirko Vogt, Dresden, DE;
Inventors:
Ulrike Roessner, Dresden, DE;
Daniel Koehler, Chemnitz, DE;
Ilona Juergensen, Dresden, DE;
Mirko Vogt, Dresden, DE;
Assignee:
Qimonda AG, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a method of fabricating a semiconductor structure, a carbon containing mask is fabricated over a dielectric layer. The mask exposes the surface of the dielectric layer at least partly in a region between two adjacent conducting lines. A contact hole is etched into the dielectric layer in the region between the two adjacent conducting lines.