The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 28, 2010

Filed:

Oct. 21, 1999
Applicants:

Woon-lam Susan Leung, San Mateo, CA (US);

James R. Swartz, Menlo Park, CA (US);

Inventors:

Woon-Lam Susan Leung, San Mateo, CA (US);

James R. Swartz, Menlo Park, CA (US);

Assignee:

Genentech, Inc., South San Francisco, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C12P 21/06 (2006.01); C12N 9/00 (2006.01); C12N 9/24 (2006.01); C12N 9/26 (2006.01); C12N 1/20 (2006.01); C12N 15/00 (2006.01); C07H 21/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

Refractile particles containing a heterologous polypeptide as an insoluble aggregate are recovered from bacterial periplasm. The process involves culturing bacterial cells so as to express nucleic acid encoding phage lysozyme and nucleic acid encoding the heterologous polypeptide under separate promoters, disrupting the cells mechanically to release the phage lysozyme so as to release refractile particles from the bacterial cellular matrix, and recovering the released refractile particles from the periplasm. Chloroform is not used in any step and the recovery step minimizes co-recovery of cellular debris with the released refractile particles.


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