The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2010
Filed:
Jun. 24, 2005
Christian David, Lauchringen, DE;
Harun Solak, Brugg, CH;
Christian David, Lauchringen, DE;
Harun Solak, Brugg, CH;
Eulitha AG, Villigen PSI, CH;
Abstract
The present invention is directed to a method for the generation of periodic curved structures in a basic support material such as the basic layer for the magnetic bit cells of a magnetic storage device. The method includes the steps of generating a number of diffraction masks such that each mask comprises at least one transmission diffraction gratings having at least one of a different periodic concentric circular pattern, spiral-like periodic pattern and periodic radial spoke pattern; positioning at least one of the diffraction masks simultaneously or successively in a certain distance of the basic support material to be patterned, the distance being mask dependent; exposing the basic support material by directing light beams through each of the diffraction masks; and interfering the different light beams diffracted by the gratings on each mask in order to generate coincident light intensity patterns on the surface of the basic support material.