The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 21, 2010

Filed:

Mar. 27, 2009
Applicants:

DO Hwan Kim, Seoul, KR;

Sangyoon Lee, Seoul, KR;

Hector Alejandro Becerril Garcia, Palo Alto, CA (US);

Mark Roberts, Albuquerque, NM (US);

Zhenan Bao, Stanford, CA (US);

Zihong Liu, Stanford, CA (US);

Inventors:

Do Hwan Kim, Seoul, KR;

Sangyoon Lee, Seoul, KR;

Hector Alejandro Becerril Garcia, Palo Alto, CA (US);

Mark Roberts, Albuquerque, NM (US);

Zhenan Bao, Stanford, CA (US);

Zihong Liu, Stanford, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided are a method of forming an organic semiconductor thin film and a method of manufacturing a semiconductor device using the. According to example embodiments, a method of forming an organic semiconductor thin film at least may include exposing a lower substrate coated with an organic semiconductor solution using a method of generating a shearing stress to the portion of the lower substrate coated with the organic semiconductor solution. A guide structure may be formed adjacent to the organic semiconductor solution.


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