The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7855047 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 21, 2010

Filed:

Dec. 16, 2009
Applicants:

Masafumi Asano, Yokohama, JP;

Tadahito Fujisawa, Tokyo, JP;

Satoshi Tanaka, Kawasaki, JP;

Inventors:

Masafumi Asano, Yokohama, JP;

Tadahito Fujisawa, Tokyo, JP;

Satoshi Tanaka, Kawasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); G03F 1/00 (2006.01); G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A reticle set, includes a first photomask having a circuit pattern provided with first and second openings provided adjacent to each other sandwiching a first opaque portion, and a monitor mark provided adjacent to the circuit pattern; and a second photomask having a trim pattern provided with a second opaque portion covering the first opaque portion in an area occupied by the circuit pattern and an extending portion connected to one end of the first opaque portion and extending outside the area when the second photomask is aligned with a pattern delineated on a substrate by the first photomask.


Find Patent Forward Citations

Asano, Masafumi. (2010). Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device (U.S. Patent No. 7855047). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7855047

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