The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 21, 2010

Filed:

Jan. 16, 2009
Applicants:

Takumi Hagiwara, Aichi, JP;

Kenichi Kawabata, Kanagawa, JP;

Mamoru Yorimoto, Tokyo, JP;

Takayuki Niihara, Kanagawa, JP;

Shinichiro Naruse, Kanagawa, JP;

Tetsu Morino, Kanagawa, JP;

Inventors:

Takumi Hagiwara, Aichi, JP;

Kenichi Kawabata, Kanagawa, JP;

Mamoru Yorimoto, Tokyo, JP;

Takayuki Niihara, Kanagawa, JP;

Shinichiro Naruse, Kanagawa, JP;

Tetsu Morino, Kanagawa, JP;

Assignee:

Ricoh Company, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/01 (2006.01);
U.S. Cl.
CPC ...
Abstract

A disclosed image forming apparatus includes a carriage having a head for jetting droplets; a pattern forming unit configured to form, on a belt, a pattern used for detecting displacement of landing positions of the droplets; a reading unit configured to scan the belt before the pattern formation to output a first result, and scan the pattern to output a second result; a correcting unit configured to correct the displacement based on the second result; a frequency analyzing unit configured to calculate frequencies of the belt and amplitudes of respective frequency components based on the first result; and a peak frequency calculating unit configured to calculate peak frequencies of the belt based on the frequencies of the belt and the amplitudes of the frequency components, the peak frequencies being frequency components whose amplitude exceeds a predetermined level. The pattern is formed at a frequency different from the peak frequencies.


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